Advances in optical metrology and instrumentation: introduction

Jonathan D. Ellis; Han Haitjema; Xiangqian Jiang; Ki Nam Joo; Richard Leach

doi:10.1364/JOSAA.405559

Advances in optical metrology and instrumentation: introduction

Jonathan D. Ellis, Han Haitjema, Xiangqian Jiang, Ki Nam Joo, Richard Leach

Optical Sciences, College of

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Optical measurement and characterization are two of the pillars of metrology. The ability to measure precisely with high dynamic range and accuracy betters our understanding of nature and the universe. In this feature issue, we present a collection of articles that delves into the fundamental techniques used to advance the field.

Original language	English (US)
Pages (from-to)	OMI1-OMI2
Journal	Journal of the Optical Society of America A: Optics and Image Science, and Vision
Volume	37
Issue number	9
DOIs	https://doi.org/10.1364/JOSAA.405559
State	Published - Sep 2019

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Computer Vision and Pattern Recognition

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10.1364/JOSAA.405559

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title = "Advances in optical metrology and instrumentation: introduction",

abstract = "Optical measurement and characterization are two of the pillars of metrology. The ability to measure precisely with high dynamic range and accuracy betters our understanding of nature and the universe. In this feature issue, we present a collection of articles that delves into the fundamental techniques used to advance the field.",

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Advances in optical metrology and instrumentation: introduction

Abstract

ASJC Scopus subject areas

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