Advances in lithography: Introduction to the feature

Andreas Erdmann; Rongguang Liang; Apo Sezginer; Bruce Smith

doi:10.1364/JOSAA.31.000LI1

Advances in lithography: Introduction to the feature

Andreas Erdmann, Rongguang Liang, Apo Sezginer, Bruce Smith

Optical Sciences

Research output: Contribution to journal › Review article › peer-review

1 Scopus citations

Abstract

Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

Original language	English (US)
Pages (from-to)	L11-L12
Journal	Journal of the Optical Society of America A: Optics and Image Science, and Vision
Volume	31
Issue number	12
DOIs	https://doi.org/10.1364/JOSAA.31.000LI1
State	Published - Dec 1 2014

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Computer Vision and Pattern Recognition

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10.1364/JOSAA.31.000LI1

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title = "Advances in lithography: Introduction to the feature",

abstract = "Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.",

author = "Andreas Erdmann and Rongguang Liang and Apo Sezginer and Bruce Smith",

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AB - Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

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Advances in lithography: Introduction to the feature

Abstract

ASJC Scopus subject areas

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