Acoustic characterization of two megasonic devices for photomask cleaning

Claudio Zanelli, Dushyanth Giridhar, Manish Keswani, Nagaya Okada, Jyhwei Hsu, Petrie Yam

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationPhotomask Technology 2016
EditorsBryan S. Kasprowicz, Peter D. Buck
ISBN (Electronic)9781510603745
StatePublished - 2016
EventPhotomask Technology 2016 - San Jose, United States
Duration: Sep 12 2016Sep 14 2016

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


OtherPhotomask Technology 2016
Country/TerritoryUnited States
CitySan Jose

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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