@inproceedings{cb5834c8f85f4f58bf888b3e8c5d7fd9,
title = "Acid-catalyzed dehydration for the design of chemical amplification resists",
abstract = "Chemical amplification (3) based on radiation-induced acidolysis is a very attractive approach to dramatically increasing radiation sensitivities of resist systems for use in short wavelength lithographic technologies. Polarity reversal has been also utilized in the chemical amplification scheme. In this paper is reported another approach to achieving the reverse polarity change. The chemical amplification resists described in this paper are based on acid-catalyzed dehydration of alcohols to olefins.",
author = "H. Ito and R. Sooriyakumaran and Y. Maekawa and Mash, {E. A.}",
year = "1992",
language = "English (US)",
isbn = "0841222169",
series = "Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering",
publisher = "Publ by ACS",
pages = "45--46",
booktitle = "Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering",
}