A sono-electrochemical technique for enhanced particle removal from tantalum surfaces

R. Balachandran; P. Deymier; S. Raghavan; M. Keswani

doi:10.1149/2.008404ssl

A sono-electrochemical technique for enhanced particle removal from tantalum surfaces

R. Balachandran, P. Deymier, S. Raghavan, M. Keswani

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Low power megasonics is of interest to semiconductor cleaning community due to minimal feature damage. In this work, megasonic field at low power density in conjunction with electrochemistry is used for enhanced removal of silica particles from tantalum wafers. Cleaning studies were conducted in air or argon saturated aqueous solutions at 0.5W/cm² in the absence and presence of applied potentials of -1.5 V or -2.0 V to tantalum (vs Ag/AgCl). The improvement in particle removal efficiency is attributed to oscillating hydrogen bubbles formed from water reduction in vicinity of tantalum surface and grown to a resonant size under suitable acoustic conditions.

Original language	English (US)
Pages (from-to)	P49-P52
Journal	ECS Solid State Letters
Volume	3
Issue number	5
DOIs	https://doi.org/10.1149/2.008404ssl
State	Published - 2014

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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AU - Raghavan, S.

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AB - Low power megasonics is of interest to semiconductor cleaning community due to minimal feature damage. In this work, megasonic field at low power density in conjunction with electrochemistry is used for enhanced removal of silica particles from tantalum wafers. Cleaning studies were conducted in air or argon saturated aqueous solutions at 0.5W/cm2 in the absence and presence of applied potentials of -1.5 V or -2.0 V to tantalum (vs Ag/AgCl). The improvement in particle removal efficiency is attributed to oscillating hydrogen bubbles formed from water reduction in vicinity of tantalum surface and grown to a resonant size under suitable acoustic conditions.

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A sono-electrochemical technique for enhanced particle removal from tantalum surfaces

Abstract

ASJC Scopus subject areas

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