A new approach to fabricating high density nanoarrays by nanocontact printing

Jian Gu; Xiaoyin Xiao; Bharath R. Takulapalli; Michael E. Morrison; Peiming Zhang; Frederic Zenhausern

doi:10.1116/1.2998754

A new approach to fabricating high density nanoarrays by nanocontact printing

Jian Gu
, Xiaoyin Xiao
, Bharath R. Takulapalli
, Michael E. Morrison
, Peiming Zhang
, Frederic Zenhausern

Basic Medical Sciences, Phoenix

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.

Original language	English (US)
Pages (from-to)	1860-1865
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	26
Issue number	6
DOIs	https://doi.org/10.1116/1.2998754
State	Published - 2008

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.2998754

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@article{e20c503cde6b478eb46d2492e8cc8803,

title = "A new approach to fabricating high density nanoarrays by nanocontact printing",

abstract = "The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.",

author = "Jian Gu and Xiaoyin Xiao and Takulapalli, \{Bharath R.\} and Morrison, \{Michael E.\} and Peiming Zhang and Frederic Zenhausern",

note = "Funding Information: The authors thank Professor Stuart Lindsay for his support of the project. This work is supported by the Proposition 301 Research Funds from the State of Arizona and National Institute of Health under R21HG00415401. ",

year = "2008",

doi = "10.1116/1.2998754",

language = "English (US)",

volume = "26",

pages = "1860--1865",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - A new approach to fabricating high density nanoarrays by nanocontact printing

AU - Gu, Jian

AU - Xiao, Xiaoyin

AU - Takulapalli, Bharath R.

AU - Morrison, Michael E.

AU - Zhang, Peiming

AU - Zenhausern, Frederic

N1 - Funding Information: The authors thank Professor Stuart Lindsay for his support of the project. This work is supported by the Proposition 301 Research Funds from the State of Arizona and National Institute of Health under R21HG00415401.

PY - 2008

Y1 - 2008

N2 - The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.

AB - The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.

UR - https://www.scopus.com/pages/publications/57249103721

UR - https://www.scopus.com/pages/publications/57249103721#tab=citedBy

U2 - 10.1116/1.2998754

DO - 10.1116/1.2998754

M3 - Article

AN - SCOPUS:57249103721

SN - 1071-1023

VL - 26

SP - 1860

EP - 1865

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

A new approach to fabricating high density nanoarrays by nanocontact printing

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