Abstract
Equispaced linear arrays that have uniformly excited central elements and monotonically decreasing flanking segments have been shown to yield low-sidelobe patterns with specified constraints on the effective radiated voltage (ERV). An analytical method for generating these distributions using a constrained least-squares (CLS) method, with restrictions on both the peak amplitude of the elements and the ERV, has been discussed in a previous work. Simulated annealing (SA) is a versatile global-optimization technique that can be effectively used for similar purposes, but can also provide additional control over some other design parameters. In this paper, we inspect both methods - indicating some of their advantages and drawbacks - through some numerical results.
Original language | English (US) |
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Pages (from-to) | 57-60 |
Number of pages | 4 |
Journal | Microwave and Optical Technology Letters |
Volume | 45 |
Issue number | 1 |
DOIs | |
State | Published - Apr 5 2005 |
Keywords
- Array pattern synthesis
- Constrained least squares
- Linear arrays
- Simulated annealing
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Electrical and Electronic Engineering