A comparative electrochemical study of copper deposition onto silicon from dilute and buffered hydrofluoric acids

G. Li, E. A. Kneer, B. Vermeire, H. G. Parks, S. Raghavan, Joong S. Jeon

Research output: Contribution to journal › Article › peer-review

43 Scopus citations

Fingerprint

Dive into the research topics of 'A comparative electrochemical study of copper deposition onto silicon from dilute and buffered hydrofluoric acids'. Together they form a unique fingerprint.

Keyphrases

Material Science

Engineering

Chemical Engineering

Chemistry