Abstract
We demonstrate midwave infrared diode lasers than span the 3-4 micrometers range. Laser active regions are multiple quantum well structures with GaInSb/InAs, type-II, broken gap superlattices for the wells and GaInAsSb for the barriers. The superlattice constituents and dimensions were tailored to reduce losses from Auger recombination. AlSb/InAs superlattices are used for both n-type and p-type laser cladding regions. A device with emission at 3.2 micrometers lased up to 255 K. We have achieved 75 mW per facet at 3.0 micrometers at an operating temperature of 140 K with an 85 microsecond(s) ec input current pulse. Device output appears to be limited by resistive heating. A four-layer, strain-balanced superlattice design offers greater laser efficiency.
Original language | English (US) |
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Pages (from-to) | 321-329 |
Number of pages | 9 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 3001 |
DOIs | |
State | Published - 1997 |
Externally published | Yes |
Event | In-Plane Semiconductor Lasers: from Ultraviolet to Midinfrared - San Jose, CA, United States Duration: Feb 10 1997 → Feb 10 1997 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering